| ○種別 (必須): | □ | 学術論文 (審査論文)
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| ○言語 (必須): | □ | 日本語
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| ○審査 (推奨): | □ | Peer Review
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| ○カテゴリ (推奨): | □ | 研究
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| ○学究種別 (推奨): |
| ○組織 (推奨): | 1. | 徳島大学.工学部.機械工学科.生産システム講座 (〜2023年3月31日)
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| ○著者 (必須): | 1. | (英) (日) 松英 達也 (読)
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| 2. | 英 崇夫
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| 3. | (英) (日) 池内 保一 (読)
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| ○題名 (必須): | □ | (英) (日) アーク・イオンプレーティングによって形成された硬質積層膜における残留応力の熱緩和
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| ○要約 (任意): | □ | (英) The present study investigates crystal orientations and residual stresses in multi hard layer films deposited by arc ion plating. TiN and CrN films approximately 1.0<I>μ</I>m thick in single layer were deposited on a stainless steel substrate. With a bias voltage of 0V, the TiN film exhibited strong {110} texture, whereas the dominant orientation of the film deposited at -100V was {111}. On the other hand, CrN films exhibited strong {110} texture with a bias voltage of -100V. The crystal structure of double-layer film had the same tendency as those for single-layer films. TiN films had very high compressive residual stresses : -8.6GPa in the {110} textured film and -10.0GPa in the {111} textured film. These residual stresses decreased with increasing annealing temperature and the reduction rate was greater for the {111} than for the {110} film. The behavior of residual stresses in the {111} and {110} textured layers of {111}/{110} textured double-layer film was identical to that for single-layer films. The CrN films had very high compressive residual stresses of -8.4GPa. These residual stresses decreased with increasing annealing temperature. However, Annealing of temperatures at 600°C showed change in peak intensities of CrN 220 diffraction. (日)
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| ○キーワード (推奨): | 1. | (英) Multi-layered film (日) (読)
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| 2. | (英) Arc ion plating (日) (読)
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| 3. | (英) Crystal structure (日) (読)
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| 4. | 残留応力 (residual stress)
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| 5. | X線回折 (X-ray diffraction)
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| ○発行所 (推奨): | □ | 日本材料学会
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| ○誌名 (必須): | □ | 材料 ([日本材料学会])
(pISSN: 0514-5163, eISSN: 1880-7488)
| ○ISSN (任意): | □ | 0514-5163
ISSN: 0514-5163
(pISSN: 0514-5163, eISSN: 1880-7488) Title: 材料Supplier: 社団法人日本材料学会Publisher: Society of Materials Science Japan (CiNii NCID)
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| ○巻 (必須): | □ | 56
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| ○号 (必須): | □ | 7
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| ○頁 (必須): | □ | 635 640
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| ○都市 (任意): | □ | 京都 (Kyoto/[日本国])
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| ○年月日 (必須): | □ | 西暦 2007年 7月 初日 (平成 19年 7月 初日)
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| ○URL (任意): | □ | http://ci.nii.ac.jp/naid/130002085860/
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| ○DOI (任意): | □ | 10.2472/jsms.56.635 (→Scopusで検索)
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| ○CRID (任意): | □ | 1390282680394465280
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| ○NAID : | □ | 130002085860
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