〔閲覧〕【著作】(Okazaki Yukio/Kobayashi Toshio/[小中 信典]/Morimoto Takashi/Takahashi Mitsutoshi/Imai K./Kado Y./Characteristics of a New Isolated p-Well Structure Using Thin Epitaxy Over the Buried Layer and Trench Isolation/[IEEE Transactions on Electron Devices])
(resolved by 0018-9383) ISSN: 0018-9383
(pISSN: 0018-9383, eISSN: 1557-9646) Title: IEEE transactions on electron devices Title(ISO): IEEE Trans Electron Devices Publisher: IEEE (NLM Catalog) (IEEE) (Scopus) (CrossRef)
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Yukio Okazaki, Toshio Kobayashi, Shinsuke Konaka, Takashi Morimoto, Mitsutoshi Takahashi, K. ImaiandY. Kado : Characteristics of a New Isolated p-Well Structure Using Thin Epitaxy Over the Buried Layer and Trench Isolation, IEEE Transactions on Electron Devices, Vol.ED-39, No.12, 2758-2764, 1992.
欧文冊子 ●
Yukio Okazaki, Toshio Kobayashi, Shinsuke Konaka, Takashi Morimoto, Mitsutoshi Takahashi, K. ImaiandY. Kado : Characteristics of a New Isolated p-Well Structure Using Thin Epitaxy Over the Buried Layer and Trench Isolation, IEEE Transactions on Electron Devices, Vol.ED-39, No.12, 2758-2764, 1992.
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Number of session users = 10, LA = 1.19, Max(EID) = 433687, Max(EOID) = 1154659.