『徳島大学 教育・研究者情報データベース (EDB)』---[学外] /
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REF=閲覧 Vacuum ([Elsevier Science])

登録情報の数

有効な情報: 36件 + 無効な情報: 2件 = 全ての情報: 38件

全ての有効な情報 (36件)
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閲覧 閲覧 徳島大学 …(30)
閲覧 閲覧 徳島大学 …(30)
閲覧 (未定義) …(4)
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抽出結果のリスト

排列順: 項目表示:
閲覧 Kikuo Tominaga : Preparation of AlN Films by Planar Magnetron Sputtering System with Facing Two Targets, Vacuum, Vol.41, No.4-6, 1154-1156, 1990..[誌名] ...
閲覧 Kenji Nishimura, Kaoru Ohya and Jun Kawata : Secondary electron emission from beryllium irradiated by plasmas in a magnetic field, Vacuum, Vol.47, No.6-8, 959-961, 1996..[誌名] ...
閲覧 Kikuo Tominaga, Takahiro Ao, Yoshifumi Sato, Ichiro Mori, Kazuya Kusaka and Takao Hanabusa : Magnetic Field Dependence of AlN Films in DC Planar Magnetron Sputtering with Opposed Targets, Vacuum, Vol.51, No.4, 549-553, 1998..[誌名] ...
閲覧 Kikuo Tominaga, Kazutaka Murayama, Ichiro Mori, Takashi Okamoto, Kazunori Hiruta, Toshihiro Moriga and Ichiro Nakabayashi : Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets, Vacuum, Vol.59, (号), 546-552, 2000..[誌名] ...
閲覧 Kikuo Tominaga and Ichiro Mori : Relation between the flux of energetic oxygen ions and the sputtered metal atoms in oxide film deposition by reactive sputtering, Vacuum, Vol.59, No.2, 574-580, 2000..[誌名] ...
閲覧 Kazuya Kusaka, Daisuke Taniguchi, Takao Hanabusa and Kikuo Tominaga : Effect of Input Power on Crystal Orientation and Residual Stress in AlN Film Deposited by dc Sputtering, Vacuum, Vol.59, No.2-3, 806-813, 2000..[誌名] ...
閲覧 Kikuo Tominaga, Toshimasa Takao, Akihiko Fukushima, Toshihiro Moriga and Ichiro Nakabayashi : Film properties of ZnO:Al films deposited by co-sputtering of ZnO:Al and contaminated Zn targets with Co, Mn and Cr, Vacuum, Vol.66, No.3-4, 511-515, 2002..[誌名] ...
閲覧 Kikuo Tominaga, Toshimasa Takao, Akihiko Fukushima, Toshihiro Moriga and Ichiro Nakabayashi : Amorphous ZnO-In2O3 transparent conductive films by simultaneous sputtering method of ZnO and In2O3 targets, Vacuum, Vol.66, No.3-4, 505-509, 2002..[誌名] ...
閲覧 Kikuo Tominaga, Takuya Kikuma, Kazuya Kusaka and Takao Hanabusa : Energetic oxygen ions in ZrO2 deposition by reactive sputtering of Zr, Vacuum, Vol.66, No.3-4, 279-284, 2002..[誌名] ...
閲覧 Takuya Kikuma, Kikuo Tominaga, Kazuo Furutani, Kazuya Kusaka, Takao Hanabusa and Takashi Mukai : GaN films deposited by planar magnetron sputtering, Vacuum, Vol.66, No.3-4, 233-237, 2002..[誌名] ...
閲覧 Kazuya Kusaka, Daisuke Taniguchi, Takao Hanabusa and Kikuo Tominaga : Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films, Vacuum, Vol.66, No.3-4, 441-446, 2002..[誌名] ...
閲覧 Tatsuya Matsue, Takao Hanabusa and Yasukazu Ikeuchi : The structure of TiN films deposited by arc ion plating, Vacuum, Vol.66, No.3-4, 435-440, 2002..[誌名] ...
閲覧 Yukako Hayashi, Kumiko Kondo, Kei-ichiro Murai, Toshihiro Moriga, Ichiro Nakabayashi and Kikuo Tominaga : ZnO-SnO2 transparent conductive films deposited by opposed target sputtering system of ZnO and SnO2 targets, Vacuum, Vol.74, No.3-4, 607-611, 2004..[誌名] ...
閲覧 Kikuo Tominaga, Hidenori Fukumoto, Kumiko Kondo, Yukako Hayashi, Kei-ichiro Murai, Toshihiro Moriga and Ichiro Nakabayashi : Al-impurity-doped Transparent Conductive Oxide Films of In2O3-ZnO System, Vacuum, Vol.74, No.3-4, 683-687, 2004..[誌名] ...
閲覧 Kazuya Kusaka, Takao Hanabusa and Kikuo Tominaga : Measurement of crystal orientation and residual stress in GaN film deposited by RF sputtering with powder target, Vacuum, Vol.74, No.3-4, 613-618, 2004..[誌名] ...
閲覧 Takao Hanabusa, Kazuya Kusaka, Tatsuya Matsue, Masayuki Nishida, Osami Sakata and Toshiki Sato : Evaluation of internal stresses in TiN thin films by synchrotron radiation, Vacuum, Vol.74, No.3-4, 571-575, 2004..[誌名] ...
閲覧 Takao Hanabusa, Tatsuya Matsue and Yasukazu Ikeuchi : Dependence to processing conditions of structure in TiN films deposited by arc ion plating, Vacuum, Vol.74, No.3-4, 647-651, 2004..[誌名] ...
閲覧 Pankaj M. Koinkar, P.P. Patil, M.A. More, V.N. Tondare and D.S. Joag : Field emission studies of CVD diamond thin films: effect of acid treatment, Vacuum, Vol.72, No.3, 321-326, 2004..[誌名] ...
閲覧 Kikuo Tominaga, Ito Daisuke and Miyamoto Yoshinori : Energetic negative ions in titanium oxide deposition by reactive sputtering in Ar/O2, Vacuum, Vol.80, (号), 654-657, 2006..[誌名] ...
閲覧 Tatsuya Matsue, Takao Hanabusa, Yasukazu Ikeuchi, Kazuya Kusaka and Osami Sakata : Alteration of internal stresses in SiO2/Cu/TiN thin films by X-ray and synchrotron radiation due to heat treatment, Vacuum, Vol.80, No.7, 836-839, 2006..[誌名] ...
閲覧 Retsuo Kawakami and Inaoka Takeshi : Effect of Argon Plasma Etching Damage on Electrical Characteristics of Gallium Nitride, Vacuum, Vol.83, No.3, 490-492, 2008..[誌名] ...
閲覧 Toshihiro Moriga, Koji Shimomura, Daisuke Takada, Hiroshi Suketa, Keisuke Takita, Kei-ichiro Murai and Kikuo Tominaga : In2O3-ZnO transparent conductive oxide film deposition on polycarbonate substrates, Vacuum, Vol.83, No.3, 557-560, 2008..[誌名] ...
閲覧 Kikuo Tominaga, Daisuke Takada, Koji Shimomura, Hiroshi Suketa, Keisuke Takita, Kei-ichiro Murai and Toshihiro Moriga : Influence of Ga2O3 addition on transparent conductive oxide films of In2O3-ZnO, Vacuum, Vol.83, No.3, 561-563, 2008..[誌名] ...
閲覧 Kenichi Inoue, Kikuo Tominaga, Takashi Tsuduki, Michio Mikawa and Toshihiro Moriga : The properties of transparent conductive In-Ga-Zn oxide films produced by pulsed laser deposition, Vacuum, Vol.83, No.3, 552-556, 2008..[誌名] ...
閲覧 Tatsuya Matsue, Takao Hanabusa, Kazuya Kusaka and Osami Sakata : Effect of heating on the residual stresses in TiN films investigated using synchrotron radiation, Vacuum, Vol.83, No.3, 585-588, 2009..[誌名] ...
閲覧 Kazuya Kusaka, Takao Hanabusa, Shoso Shingubara, Tatsuya Matsue and Osami Sakata : Measurement of electromigration-induced stress in aluminum alloy interconnection, Vacuum, Vol.83, No.3, 637-640, 2009..[誌名] ...
閲覧 Tohru Ishitani, Takuya Yamanaka, Kensuke Inai and Kaoru Ohya : Secondary electron emission in scanning Ga ion, He ion and electron microscope, Vacuum, Vol.84, No.8, 1018-1024, 2010..[誌名] ...
閲覧 Retsuo Kawakami, Tominaga Kikuo, Okada Kenji, Nouda Takahiro, Inaoka Takeshi, Takeichi Atsushi, Fukudome Toshiaki and Murao Kenichi : Etch Damage Characteristics of TiO2 Thin Films by Capacitively Coupled RF Ar Plasmas, Vacuum, Vol.84, No.12, 1393-1397, 2010..[誌名] ...
閲覧 Jin-Ping Ao, Suzuki Asato, Sawada Kouichi, Shinkai Satoko, Yoshiki Naoi and Yasuo Ohno : Schottky contacts of refractory metal nitrides on gallium nitride using reactive sputtering, Vacuum, Vol.84, No.12, 1439-1443, 2010..[誌名] ...
閲覧 Jin-Ping Ao, Yoshiki Naoi and Yasuo Ohno : Thermally stable TiN Schottky contact on AlGaN/GaN heterostructure, Vacuum, Vol.87, No.1, 150-154, 2013..[誌名] ...
閲覧 Retsuo Kawakami, Atsushi Takeichi, Masahito Niibe, Masashi Konishi, Yuta Mori, Takuya Kotaka, Takeshi Inaoka, Kikuo Tominaga and Takashi Mukai : Capacitively Coupled Radio Frequency Nitrogen Plasma Etch Damage to N-Type Gallium Nitride, Vacuum, Vol.87, 136-140, 2013..[誌名] ...
閲覧 Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano, Tatsuo Shirahama, Shodai Hirai and Takashi Mukai : Comparison between AlGaN Surfaces Etched by Carbon Tetrafluoride and Argon Plasmas: Effect of the Fluorine Impurities Incorporated in the Surface, Vacuum, Vol.119, 264-269, 2015..[誌名] ...
閲覧 Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano and Takashi Mukai : AlGaN Surfaces Etched by CF4 Plasma with and without the Assistance of Near-Ultraviolet Irradiation, Vacuum, Vol.136, 28-35, 2017..[誌名] ...
閲覧 Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano, Yuma Araki, Yuki Yoshitani, Chisato Azuma and Takashi Mukai : Characteristics of TiO2 Thin Films Surfaces Treated by O2 Plasma in Dielectric Barrier Discharge with the Assistance of External Heating, Vacuum, Vol.152, 265-271, 2018..[誌名] ...
閲覧 Retsuo Kawakami, Masahito Niibe, Yoshitaka Nakano, Shin-ichiro Yanagiya, Yuki Yoshitani, Chisato Azuma and Takashi Mukai : Effects of Ultraviolet Wavelength and Intensity on AlGaN Thin Film Surfaces Irradiated Simultaneously with CF4 Plasma and Ultraviolet, Vacuum, Vol.159, 45-50, 2019..[誌名] ...
閲覧 Xiaobo Li, Taofei Pu, Taiki Hoshi, Tong Zhang, Xie Tian, Shigeki Fujiwara Joseph Luke, Hiroshi Kitahata, Liuan Li, Sachio Kobayashi, Motoo Ito, Xianjie Li and Jin-Ping Ao : GaN Schottky barrier diodes with nickel nitride anodes sputtered at different nitrogen partial pressure, Vacuum, Vol.162, 72-77, 2019..[誌名] ...

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